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KMID : 1011420190240030287
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Journal of Korean Ophthalmic Optics Society
2019 Volume.24 No. 3 p.287 ~ p.294
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A Study of the properties of TiO2/SiO2/ZrO2 Thin Films Depositedby RF Magnetron Sputtering
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Jang Dae-Kwang
Kim Young-Mi
Jung Yee-Rin
Lee Ju-Hak
Ha Byung-Ho
Kim Ki-Hong
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Abstract
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Purpose: To study the antifogging properties of thin films required for safety goggles used in industrial applications, general vision correction glasses, and various optical instruments.
Method: A radio frequency (RF) magnetron sputtering method was used to fabricate multilayer thin films composed of a stack of individual thin films sputter-coated from materials such as TiO2, SiO2, and ZrO2. Glass slides were used as the substrates. The sputtering vacuum was set to 4.0 × 10-2 torr, RF-power was 70 W, and the distance between the target and the substrate was 80 mm. The optical and mechanical properties of the optical film samples were analyzed.
Results: Scanning electron microscopy (SEM) and atomic force microscopy (AFM) was used to analyze the morphology and crystal nature of the fabricated optical thin films. SEM-energy dispersive x-ray spectroscopy (SEM-EDS) was used for chemical composition analysis. The light transmittance was measured using a UV-visible spectrophotometer and contact angle was analyzed using a contact angle analyzer.
Conclusion: When the outermost layer of the optical thin film was SiO2, a TiO2 single thin film, or a multilayer thin film, antifogging properties were superior to optical thin films fabricated under other conditions. We confirmed that RF magnetron sputtering was an excellent deposition method to improve the optical performance of spectacle lenses and optical instruments.
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KEYWORD
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RF magnetron sputtering, TiO2, SiO2, ZrO2, Optical thin film
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